The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 24, 2001
Filed:
Jun. 09, 1999
Applicant:
Inventors:
Hiroyuki Makino, Hiratsuka, JP;
Masaru Tanaka, Niihama, JP;
Kiyoshi Awai, Hiratsuka, JP;
Toshiyuki Sakemi, Niihama, JP;
Assignee:
Sumitomo Heavy Industries, Ltd., Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/432 ; C23C 1/606 ;
U.S. Cl.
CPC ...
C23C 1/432 ; C23C 1/606 ;
Abstract
A film deposition apparatus to which the present invention is applied comprises a vacuum chamber,, a plasma beam generator,, a main hearth,which is disposed within the vacuum chamber and which serves as an anode containing a vaporizable material Cu, and an auxiliary anode,surrounding the main hearth, the auxiliary anode being formed of an annular permanent magnet,and a coil,. A Cu film is formed on a substrate,placed opposite to the main hearth.