The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2001
Filed:
Mar. 08, 1999
Applicant:
Inventors:
Jiaqi Xiao, Houston, TX (US);
Ingo Michael Geldmacher, Houston, TX (US);
Assignee:
Baker Hughes Incorporated, Houston, TX (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06F 1/900 ;
U.S. Cl.
CPC ...
G06F 1/900 ;
Abstract
A method of focusing the measurements from an array type induction logging tool using an inhomogeneous background rather than a homogeneous background. A modeled inhomogeneous background response can be separated from the measured response and focused directly using focusing target functions. The residue, the difference between the measured response and the background response, can then be focused using conventional linear focusing methods. A final focusing response is obtained by adding the two focusing responses.