The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 2001

Filed:

Jan. 31, 1997
Applicant:
Inventors:

John A. Nial, Jr., Park Hall, MD (US);

J. David De Leon, Bel Alton, MD (US);

Nickolas Kaloterakis, White Plains, MD (US);

T. William Ammons, Jr., Temple Hills, MD (US);

Joseph Dulcey, Waldorf, MD (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F42B 3/18 ;
U.S. Cl.
CPC ...
F42B 3/18 ;
Abstract

An electromagnetic flux suppression includes a three stage filtering system to protect against electromagnetic interference and electrostatic discharge and has a first stage high voltage section that filters a high voltage pulse by providing a spark gap to ionize the ambient air and thus effectively form a shunt. A second stage filter has a front end capacitive interface followed by an inductive line to filter out radio frequency arcing that occurs between two bodies thus exposing them to radio frequency radiation. A third stage filter includes a radio frequency low pass filter to reinforce the capacitive inductance filter.


Find Patent Forward Citations

Loading…