The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2001
Filed:
Dec. 20, 1999
Applicant:
Inventor:
Mark Shi Wang, Irvine, CA (US);
Assignee:
Xerox Corporation, Stamford, CT (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 2/608 ;
U.S. Cl.
CPC ...
G02B 2/608 ;
Abstract
A single rotating polygon mirror with adjacent facets having different tilt angles reflects and splits the scanning beam to multiple photoreceptors in a raster output scanning (ROS) system. The mirror can have two or four alternating facets with different tilt angles. Two different light beams form two different light sources can be reflected and split from the polygon mirror contemporaneously to multiple photoreceptors. The split beams from the polygon mirror facets can share a common f-theta scan lens.