The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 17, 2001

Filed:

Sep. 11, 2000
Applicant:
Inventors:

Tatsuyuki Denawa, Kanagawa, JP;

Kimihiro Nakatsuka, Kyoto, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03B 2/732 ; G03B 2/752 ; G03B 2/730 ; G03B 7/00 ; G02B 7/00 ;
U.S. Cl.
CPC ...
G03B 2/732 ; G03B 2/752 ; G03B 2/730 ; G03B 7/00 ; G02B 7/00 ;
Abstract

A photosensitive material which has been exposed by an exposure device is fed into a processor, which is an automatic developing device, by a delivery section and processed. Within the exposure device, negative pressure is generated for holding the photosensitive material by suction. A gas outflow preventing device provided at the delivery section includes a chamber disposed in an upper vicinity of guides of a transport device. A nozzle that protrudes from this chamber is provided opposing an exposed photosensitive material insertion slot of the processor. The gas outflow preventing device blows air, which is fed into the chamber by operation of a blower fan, from an ejecting slit formed in the nozzle toward the photosensitive material insertion slot. This blowing of air, without interfering with output of the photosensitive material to the processor, prevents air in the processor flowing out through the photosensitive material insertion slot to the exposure device side.


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