The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2001
Filed:
Oct. 01, 1996
Applicant:
Inventor:
Chao-Ming Koh, Suan-She Village, TW;
Assignee:
Industrial Technology Research Institute, Hsin-Chu, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 2/976 ; H01L 2/994 ; H01L 3/1062 ;
U.S. Cl.
CPC ...
H01L 2/976 ; H01L 2/994 ; H01L 3/1062 ;
Abstract
A MOSFET device fabricated by a method that reduces, the risk of gate to source and drain bridging, has been developed. The process features fabricating a polysilicon structure, which is wider at the top than at the bottom, with a source and drain region, self-aligned to the narrower, underlying polysilicon layer. Subsequent metallization results in metal coverage, only on the surfaces of the wider polysilicon layer. An anneal cycle then converts only the wider polysilicon feature to a metal silicide, resulting in a polycide gate structure, comprised of a wider, overhanging metal silicide layer, on a narrower, underlying polysiliocn layer.