The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2001
Filed:
Oct. 26, 1998
Feng Jin, Orange, FL (US);
Agere Systems Guardian Corp., Miami Lakes, FL, US;
Abstract
A method of manufacturing an integrated circuit using an imaging system having a mask and an energy source that produces an exposure field. A substrate is moved across the exposure field while changing the depth of focus of the imaging system relative to the substrate. The depth of focus may be changed by moving the substrate, the mask, or both, relative to each other changes the depth of focus. The depth of focus may be oscillated according to a periodic waveform where the waveform is equal to the time for a typical point on the substrate to pass through the exposure field.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile