The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2001
Filed:
Mar. 30, 1999
Mustafa Pinarbasi, Morgan Hill, CA (US);
Alfred Floyd Renaldo, San Jose, CA (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
A method makes a highly defined bilayer lift-off mask wherein lift-off mask material is subjected to an electron beam for decreasing the molecular weight of a bottom release layer and increasing the molecular weight of a top photoresist layer so that a weak developer can be employed for patterning the bottom release layer and ion milling, which is employed for removing layers not covered by the lift-off mask, does not alter a track width of the top photoresist layer.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile