The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2001
Filed:
Sep. 22, 1998
Applicant:
Inventor:
Yide Zhang, Storrs, CT (US);
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C21D 1/04 ;
U.S. Cl.
CPC ...
C21D 1/04 ;
Abstract
A method of magnetic annealing a crystalline or nanocrystalline magnetic alloy under application of a dynamic magnetic field, i.e., an external magnetic field whose direction undergoes a periodic change in a plane, at an elevated temperature, preferably in a range of from about 300° C. to about 800° C. The applied dynamic magnetic field preferably has a maximum strength in a range of from about 1 to about 1000 Oersteds and is one of a rotation magnetic field, an elliptic-polarized magnetic field, an oscillation magnetic field, and a pair of pulsed magnetic fields.