The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2001
Filed:
Aug. 27, 1999
Nicola Dominelli, Surrey, CA;
David R. Pugh, Vancouver, CA;
Gordon R. Ashby, Surrey, CA;
David Casson, Surrey, CA;
Electric Power Research Institute, Inc., Palo Alto, CA (US);
Abstract
The present invention monitors and removes contaminants from dielectric fluids by utilizing an apparatus having a chamber and tube configuration. The chamber encloses a plurality of tubes which include porous hollow fibers with an inert polymer coating. Conduits route the dielectric fluid to and from operative equipment. An atmosphere control device creates an atmospheric condition within the chamber that causes contaminants within the dielectric fluid to migrate through the tubes into the chamber, thereby producing refined dielectric fluid. The method of the present invention removes contaminants from a dielectric fluid. The dielectric fluid is routed from operative equipment and passes through tubes enclosed within a chamber. An atmospheric condition is created within the chamber to cause contaminants within the dielectric fluid to migrate into the chamber. A refined dielectric fluid is produced which is directed back to the operative equipment. The contaminants removed from the dielectric fluid may further be analyzed, monitored, have any moisture therein removed, or be vented to atmosphere.