The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 17, 2001
Filed:
Aug. 16, 1999
Alvaro Maury, Orlando, FL (US);
Jose Rodriguez, Orlando, FL (US);
Lucent Technologies Inc., Murray Hill, NJ (US);
Abstract
A chemical-mechanical polishing apparatus includes a polishing table having a top surface and an annular trench formed in the top surface and defining an annular configured polishing area in the polishing table. A drive mechanism rotates the polishing table. An annular diaphragm is positioned within the annular configured polishing area and has a top surface and bottom surface. An annular configured polishing pad is positioned on the diaphragm. A fluid actuated pressure mechanism is associated with the annular configured polishing area for exerting pressure upward onto the bottom surface of the annular diaphragm as a polishing table rotates for exerting an upward biasing pressure onto the polishing pad and imparting a desired counter force against any downward pressure exerted against a semiconductor wafer during chemical-mechanical polishing.