The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 10, 2001

Filed:

Jun. 06, 1996
Applicant:
Inventors:

Robert R. Alfano, Bronx, NY (US);

Gordon E. Anderson, Rego Park, NY (US);

Feng Liu, Bronx, NY (US);

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 2/100 ;
U.S. Cl.
CPC ...
G02B 2/100 ;
Abstract

A method and system for imaging a small object in or behind a highly scattering medium comprises a laser source for illuminating the object with an ultrashort collimated beam of light and a novel microscope for forming a magnified image of the object using light emergent from the highly scattering medium, the emergent light consisting of a scattered component and a non-scattered component. The novel microscope comprises an objective, an eyepiece and an aperture centered at the back focal plane of the objective. The aperture, which may be of a fixed or variable size and controlled electronically or by a computer serves to spatially filter the scattered light component of the light emergent from the highly scattering medium. The system may also comprise a streak camera or similar time resolving device positioned at the image plane of the microscope for temporally filtering the scattered light component of the light emergent from the highly scattering medium.


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