The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2001
Filed:
Aug. 28, 1995
Applicant:
Inventors:
Thomas Acquaviva, Penfield, NY (US);
Paul W. Morehouse, Jr., Webster, NY (US);
Assignee:
Xerox Corporation, Stamford, CT (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01B 1/130 ;
U.S. Cl.
CPC ...
G01B 1/130 ;
Abstract
A method and apparatus for determining the properties of roughness and thickness of a substrate to be processed through a machine, and correspondingly adjusting those machine parameters that are affected and which can be optimized based on varying levels of these substrate properties.
Quick Actions:
Acquaviva, Thomas. (2001). Electrostatic process control based upon both the roughness and the thickness of a substrate (U.S. Patent No. 6215552). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6215552
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile