The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2001
Filed:
Dec. 22, 1999
Applicant:
Inventor:
Joseph C. Runkle, Manchester-by-the-Sea, MA (US);
Assignee:
Ultraclad Corporation, Andover, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B22F 3/15 ; B22F 3/16 ; C23C 1/410 ; C23C 1/414 ; C23C 1/434 ;
U.S. Cl.
CPC ...
B22F 3/15 ; B22F 3/16 ; C23C 1/410 ; C23C 1/414 ; C23C 1/434 ;
Abstract
A method of producing a silicon aluminum sputtering target is provided. The target is formed from a powder base of between about 80% to about 95% by weight silicon and about 5% to about 20% by weight aluminum which is placed in a containment unit, heated under vacuum and then sealed. The base is then subjected to a pressure greater than about 3000 psi and heated to a temperature between about 1076° F. and about 1652° F. such that some, but not more than 30%, of the resulting target is formed from liquid phase silicon-aluminum.