The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 10, 2001
Filed:
Sep. 07, 1999
Pamela C. Wang, Bedford, NH (US);
Origitech LLC, Bedford, NH (US);
Abstract
A weaving reed spacing arrangement having a plurality of reed dents fixed in certain positions and which may be located in a reed baulk. The reeds may be plain reeds or reeds, with any profile, usable virtually on any loom. The dents are formed of wires and spaces and are variably spaced. The variable spaces are formed a number of techniques to produce fabrics with a desired warp density across the entire width of a given fabric. The reed may produce a consistent warp end density which improves the mechanical properties of a given fabric and also provides virtually consistent air permeability across the width of the finished fabrics. The reed can also produce changes in warp end density in a given fabric for certain desired effects. A rotary type reed and weaving rotor for multiple-shed looms are also disclosed.