The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 03, 2001

Filed:

Nov. 08, 1999
Applicant:
Inventors:

Makoto Ryoji, Moriya-machi, JP;

Takeshi Hasegawa, Tsukuba, JP;

Masahito Ban, Noda, JP;

Yukitaka Mori, Noda, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 2/702 ; H05H 1/24 ;
U.S. Cl.
CPC ...
H01J 2/702 ; H05H 1/24 ;
Abstract

A plurality of extracting orifices,for extracting the electron beam from a discharge portion,into a plasma process chamber,via a compartment,are provided radially. A plurality of accelerating electrodes,are arranged in the process chamber,. The electron extracting direction from the extracting orifices,is set in substantially parallel with an object surface,. The number and the arrangement of the accelerating electrodes,are set such that a density distribution of the excited plasma has an oprimal state for processing the object. The object having a large area can be processed appropriately.


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