The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 03, 2001

Filed:

Jun. 11, 1999
Applicant:
Inventors:

Jin-Seock Kim, Seoul, KR;

June-Ing Kil, Kyungki-do, KR;

Dong-Jin Park, Kyungki-do, KR;

Shang-Oa Park, Kyungki-do, KR;

Chun-Duek Lee, Kyungki-do, KR;

Seog-Young Lim, Kyungki-do, KR;

Yang-Sun Kim, Kyungki-do, KR;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C11D 9/04 ;
U.S. Cl.
CPC ...
C11D 9/04 ;
Abstract

A photoresist stripping composition suitable for both of the single wafer treatment method using an air knife process and a dipping photoresist stripping method. The composition comprises 5-15 weight % of alkanolamine, 35-55 weight % of sulfoxide or sulfone compound and 35-55 weight % of glycolether, and preferably further includes surfactant, and also 1-10 weight % of tetra methyl ammonium hydroxide or 3-15 weight % of benzenediol and 1-15 weight % of alkylsulfonic acid.


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