The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2001
Filed:
Oct. 15, 1999
Applicant:
Inventors:
Hyun Pyo Jeon, Taejon, KR;
Seong Ju Kim, Taejon, KR;
Joo Hyeon Park, Taejon, KR;
Jong Bum Lee, Taejon, KR;
Assignee:
Korea Kumho Petrochemical Co., Ltd., Seoul, KR;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03C 1/73 ; C08F 1/602 ; C08F 1/638 ; C08F 2/602 ; C08F 2/606 ;
U.S. Cl.
CPC ...
G03C 1/73 ; C08F 1/602 ; C08F 1/638 ; C08F 2/602 ; C08F 2/606 ;
Abstract
This invention relates to a copolymer for the manufacture of chemical amplified photoresist and a chemical amplified positive photoresist composition comprising a copolymer for the manufacture of chemical amplified photoresist as a base resin, as represented by the following formula 1, an acid generator and additive,
Quick Actions:
Jeon, Hyun. (2001). Copolymer for the manufacture of chemical amplified photoresist and a positive photoresist composition using the same (U.S. Patent No. 6210859). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6210859
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile