The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 03, 2001
Filed:
Jul. 26, 1999
Applicant:
Inventors:
Akira Fujinoki, Fukushima, JP;
Akihiko Sugama, Fukushima, JP;
Masaatsu Kataoka, Fukui, JP;
Wolfgang Englisch, Kelkheim, DE;
Assignee:
Other;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C03B 2/304 ;
U.S. Cl.
CPC ...
C03B 2/304 ;
Abstract
A method of preparing a high purity massive synthetic silica glass article. The method includes a homogenizing step, wherein a rod shaped synthetic silica glass material has a greater optical homogeneity in a plane perpendicular to its rotational axis than a plane parallel thereto, a step of forming the homogeneous synthetic silica glass and a step of cutting the formed synthetic silica glass.