The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2001
Filed:
Dec. 01, 1998
Khanh B. Nguyen, San Mateo, CA (US);
Harry Levinson, Saratoga, CA (US);
Advanced Micro Devices Inc., Sunnyvale, CA (US);
Abstract
A method (,) of characterizing a lithographic scanning system includes the steps of printing a first pattern (,) using a reticle (,) having a first orientation with respect to the lithographic scanning system and measuring a critical dimension of the first pattern at a plurality of points (,). The method (,) further includes printing a second pattern (,) using the reticle (,) having a second orientation with respect to the lithographic scanning system different than the first orientation and measuring a critical dimension of the second pattern at the plurality of points (,). The measured critical dimension data is then used to determine a reticle critical dimension component and a non-reticle critical dimension component of the patterns at the plurality of points (,) and a scanning system critical dimension component of the patterns is then determined using the non-reticle critical dimension component data along a plurality of points corresponding to a scanning direction of the lithographic scanning system (,).