The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2001
Filed:
Mar. 04, 1999
Tetsuya Oshino, Kawasaki, JP;
Nikon Corporation, Tokyo, JP;
Abstract
An X-ray projection exposure apparatus includes a mask stage configured to hold a mask having a predetermined pattern thereon, a substrate stage configured to hold a substrate, and an X-ray source that emits exposing X-rays and detection light having a wavelength different from the exposing X-rays for use in detecting a position of at least one of the mask and the substrate. The apparatus further includes an X-ray illumination optical system configured to direct the exposing X-rays and the detection light towards the mask, an X-ray projection and focusing optical system for receiving the exposing X-rays that have interacted with the mask, and projecting and focusing an image of the predetermined pattern on the mask onto the substrate, and a detector for detecting the detection light that has interacted with the mask to derive the position of the at least one of the mask and the substrate.