The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 27, 2001

Filed:

Sep. 29, 1998
Applicant:
Inventors:

Yasushi Yamauchi, Tsukuba, JP;

Mitsunori Kurahashi, Tsukuba, JP;

Naoki Kishimoto, Tsukuba, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H05H 3/00 ;
U.S. Cl.
CPC ...
H05H 3/00 ;
Abstract

A pulse discharge is caused between an electrode in an insulating nozzle,jetting a gas in vacuum and a skimmer,An apparatus for performing the method includes an insulating nozzle,perforated with a gas jet hole,at a front end thereof and having a needle-like electrode,at an inside thereof, and includes a skimmer,formed in a funnel-like shape and having an opening portion,at a front end thereof. The opening,is arranged at a position remote from the gas jet hole 2,of the insulating nozzle,by a predetermined distance. The method and apparatus can be used in the field of measurement, material synthesis and the like with an object of surface science, and can form simultaneously and with high intensity both pulsed metastable atom beam and pulsed ultraviolet radiation which can be preferably used as a probe for investigating the electronic state at a surface of a substance and several layers on the inner side of the surface. It can also preferably be used for removing contamination or for depositing materials on the surface of a substrate by surface chemical reaction.


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