The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 27, 2001
Filed:
May. 19, 1999
Brian S. Lee, New York, NY (US);
Infineon Technologies North America Corp., San Jose, CA (US);
Abstract
In accordance with the invention, a method for opening holes for semiconductor fabrication includes the steps of providing a pad stack on a substrate, forming a hard mask layer on the pad stack, the hard mask layer selectively removable relative to the pad stack, patterning a resist layer on the hard mask layer, the resist layer being selectively removable relative to the hard mask layer and having a thickness sufficient to prevent scalloping, etching the hard mask layer selective to the resist layer down to the pad stack, removing the resist layer. After removing the resist layer, the pad stack is etched selective to the hard mask layer such that a hole is opened down to the substrate.