The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2001
Filed:
Dec. 08, 1998
Amplitude mask, and apparatus and method for manufacturing long period grating filter using the same
Joo-nyung Jang, Suwon, KR;
Samsung Electronics Co., Ltd., Suwon, KR;
Abstract
An amplitude mask, and an apparatus and method for manufacturing a long period grating filter using the same, are provided. When a long period grating is manufactured by selectively passing laser light to an optical fiber, the amplitude mask periodically passes laser light to the optical fiber. The amplitude mask includes two masks having periodically alternating pass areas for passing the laser light and nonpass areas for preventing passing of the laser light, the two masks being continuously rotated in opposite directions. The period of the pass area thus continuously changes. In this mask, two masks each having a predetermined period are rotated in opposite directions, to thus provide an amplitude mask period depending on the angle of rotation. Thus, the period of the amplitude mask can be continuously changed.