The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2001
Filed:
Jul. 20, 1999
Andrzej R. Badzian, State College, PA (US);
Rustum N. Roy, State College, PA (US);
Pravin Mistry, Dearborn, MI (US);
Manuel C. Turchan, Northville, MI (US);
QQC, Inc., Dearborn, MI (US);
Abstract
A method for producing well-crystallized adherent diamond layers on WC—Co substrates. An array of focused laser beams is scanned across the WC—Co sample. Useful lasers include the excimer, YAG:Nd, and carbon dioxide types. The process is conducted in open air with carbon dioxide and nitrogen gases delivered for shrouding the substrate. A luminous plasma is found a few mm above the WC—Co insert. The duration of the deposition process in a typical case is approximately 40 s. This typically gives 20-40 &mgr;m thick coatings. The vertical growth rate is about 1 &mgr;m/s.