The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 20, 2001
Filed:
May. 18, 1999
Hiroshi Nomura, Shorewood, MN (US);
NeoMecs Incorporated, Eden Prairie, MN (US);
Abstract
Porous polymeric materials are hardened by a process of plasma-annealing, involving treatment of at least one surface with a gas plasma formed by glow discharge through a gas containing a saturated alkane or an acetylene. Plasma-annealed porous polymers with reduced adsorption toward proteins were obtained by exposure to a glow discharge through a gas mixture containing an alkane such as methane in combination with oxygen, air, or a hydrophilic unsaturated organic monomer. For example, porous polysulfone sheet and hollow fiber were plasma-annealed by treatment with a gas plasma containing methane and air or acrylic acid with simultaneous deposition of a hydrophilic polymerizate thereon.