The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2001
Filed:
Dec. 03, 1999
Eric M. Gross, Rochester, NY (US);
Mark A. Scheuer, Williamson, NY (US);
Edward W. Smith, Jr., Rochester, NY (US);
Yao Rong Wang, Webster, NY (US);
Xerox Corporation, Stamford, CT (US);
Abstract
A process control method for color quality control maintains a preselected developed mass per unit area (DMA) of black solid area by adjusting the development field during run-time operation. In order to estimate the DMA of a solid black control patch, which is outside the sensing range of an infra-red densitometer (IRD), an estimation technique is employed which accounts for system changes due to adjustment of the development field. The estimation technique includes generating two or more test patches, using a patch generator, which have DMA readings within the sensing range of the IRD. The DMA readings and corresponding development voltages of the test patches are sensed and used to calculate a developability curve. The developability curve is projected into a region beyond the sensing range of the IRD. From the developability curve, the DMA of the solid black control patch is estimated and employed in a closed feedback loop to return the system to the preselected DMA by adjusting the development field. Development field control provides faster response to toner density changes than toner concentration control, and thus, results in better color quality control.