The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 13, 2001

Filed:

Nov. 19, 1999
Applicant:
Inventors:

Charles John Bennett, Hilton, NY (US);

Carl Allen Luft, Lima, NY (US);

Jay Leroy Margut, Rochester, NY (US);

William David Van Arsdale, Spencerport, NY (US);

Assignee:

Nexpress Solutions LLC, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03G 1/500 ; B41J 2/435 ;
U.S. Cl.
CPC ...
G03G 1/500 ; B41J 2/435 ;
Abstract

A mechanism for supporting said light-emitting device in said reproduction apparatus in an electrographic reproduction apparatus having a light-emitting device for forming, on a dielectric support member, a charge pattern corresponding image-wise to information to be reproduced. The light-emitting device support mechanism includes a carriage attached to the reproduction apparatus and movable relative thereto to a first operative position and a second remote position. A pivot mechanism is supported by the carriage so as to provide a pivot axis, the light-emitting device being mounted on the pivot mechanism for movement about the pivot axis. A reference feature is located in the reproduction apparatus, the reference feature located in a predetermined relation relative to the dielectric support member. A movable latch member is selectively engagable with the light-emitting device to move the light-emitting device from a first position, remote from the reference feature, movable with the carriage to the first operative position or the second remote position, to a second position in engagement with the reference feature to be operatively associated with the dielectric support member.


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