The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2001
Filed:
Aug. 24, 1995
Applicant:
Inventors:
David R. Walt, Lexington, MA (US);
Brian G. Healey, Sommerville, MA (US);
Assignee:
Trustees of Tufts College, Boston, MA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02B 6/08 ;
U.S. Cl.
CPC ...
G02B 6/08 ;
Abstract
The present invention is a photodeposition methodology for fabricating a three-dimensional patterned polymer microstructure. A variety of polymeric structures can be fabricated on solid substrates using unitary fiber optic arrays for light delivery. The methodology allows micrometer-scale photopatterning for the fabricated structures using masks substantially larger than the desired dimensions of the microstructure.