The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2001
Filed:
Nov. 03, 1998
Applicant:
Inventor:
Naokatsu Ikegami, Tokyo, JP;
Assignee:
Oki Electric Industry Co., Ltd., Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G03F 7/00 ; B44C 1/22 ;
U.S. Cl.
CPC ...
G03F 7/00 ; B44C 1/22 ;
Abstract
A method for forming a contact hole including forming a hole opening in a polysilicon film formed on an insulating film on the surface of a substrate; depositing a polysilicon film on the inner surface of the hole opening to make the diameter of the hole opening smaller; and carrying out dry etching to form an opening of the contact hole in the insulating film, using the polysilicon film as a mask. A gas mixture composed of CHF,and CO is used as an etching gas and a non-doped silicon oxide film is used as the insulating film.