The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 13, 2001
Filed:
Feb. 18, 1998
Applicant:
Inventors:
Fumio Uehara, Hachioji, JP;
Kiyofumi Sakaguchi, Yokohama, JP;
Kazutaka Yanagita, Yokohama, JP;
Masakazu Harada, Akiruno, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B08B 3/02 ;
U.S. Cl.
CPC ...
B08B 3/02 ;
Abstract
An ultrasonic bath (,) is arranged below a wafer processing bath (,). Wafers (,) are processed while ultrasonic waves are transmitted from the ultrasonic bath (,) to the wafer processing bath (,). The wafers (,) are processed while being entirely dipped into the wafer processing bath (,) and rotated by wafer rotating rods (,).
Quick Actions:
Uehara, Fumio. (2001). Wafer processing apparatus, wafer processing method, and semiconductor substrate fabrication method (U.S. Patent No. 6199563). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/6199563
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile