The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2001
Filed:
Feb. 19, 1999
Wayne Albert Barringer, Boca Raton, FL (US);
Guenter Schaefer, Fort Lauderdale, FL (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
Apparatus for contact exposing each side of a substrate to a different image on a mask includes a first-side imaging station for imaging the first side of the substrate, a second-side imaging station for imaging the second side thereof, an intermediate station between the imaging stations for inverting the substrate. In each imaging station, the substrate is moved longitudinally with a transport carriage, from which it is transferred to an imaging carriage to be driven to an imaging point at which illumination through the mask occurs. The imaging carriage moves in both longitudinal and transverse directions, providing for both exposure to a mask covering the substrate and for step-and-repeat exposure of multiple portions of the substrate to a smaller image. Before exposure, the top surface of the substrate is aligned to be parallel to the adjacent mask, fiducial markings in the substrate are aligned with fiducial markings on the mask, and air is evacuated from the area between the mask and the substrate.