The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 06, 2001

Filed:

Jul. 21, 1999
Applicant:
Inventors:

Kun Lin Cheng, Tu-Cheng, TW;

Wen-Tung Chen, Tu-Cheng, TW;

Assignee:

China Textile Institute, Taipei Hsien, TW;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08G 7/310 ; C08G 6/900 ; C07C / ;
U.S. Cl.
CPC ...
C08G 7/310 ; C08G 6/900 ; C07C / ;
Abstract

The present invention relates to the synthesis of new type of diamine monomer, 1,3-bis(4-amonophenoxy)naphthalene, and with such a compound to produce a series of aromatic polymers, including polyamide, polyimide, copoly(amide-imide)s, etc., such polymers having excellent resistance to heat and mechanical properties.


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