The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Mar. 06, 2001

Filed:

Jan. 14, 2000
Applicant:
Inventor:

Risaku Toda, Plano, TX (US);

Assignee:

Ball Semiconductor, Inc., Allen, TX (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 2/100 ;
U.S. Cl.
CPC ...
H01L 2/100 ;
Abstract

A method and system for making small gaps in a MEMS device is disclosed. The MEMS device is first made with a sacrificial layer where the gap is to reside. The device can then be assembled, including forming a protective coat surrounding the device. Once the protective coat is formed, small holes in the protective coat can be made to expose the sacrificial layer to an external environment. The holes can be formed using laser ablation. After the small holes have been made, an etchant can then be applied through the holes to remove the sacrificial layer.


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