The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2001
Filed:
Dec. 10, 1998
Simon Robert Early, London, GB;
George Edwin Harrison, Billericay, GB;
John Wilson Kippax, Richmond, GB;
Kvaerner Process Technology Limited, London, GB;
Abstract
Disclosed is a reactor and process for exothermic vapour phase reaction, wherein the reactor (,) comprises a pressure vessel (,) having an inlet (,) for reactant(s) and an outlet (,) for products; a plurality of beds (,) with heterogeneous catalyst, each bed supported by a catalyst support grating (,); a vapour collection chamber (,) and a vapour redistribution chamber (,) between successive pair(s) of beds for redistribution of vapourous reaction mixture over the inlet of the next bed; a diaphragm (,) separating the vapour collection chamber (,) from the vapour redistribution chamber; at least one pair of nested trough members extending at least partially across the diaphragm, each comprising an inner trough member (,) having one or more apertures (,), an outer trough (,) having one or more apertures (,) and a quench gas conduit (,) provided with apertures (,); the apertures (,) arranged to provide a tortuous pathway for the flow of vapour and quench gas.