The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Mar. 06, 2001
Filed:
Feb. 16, 1999
Applicant:
Inventors:
Josef Robert Unternahrer, Niskayuna, NY (US);
William Taylor Lotshaw, Niskayuna, NY (US);
Phillip Randall Staver, Hagaman, NY (US);
Assignee:
General Electric Company, Schenectady, NY (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C21D 1/09 ; H01S 3/098 ;
U.S. Cl.
CPC ...
C21D 1/09 ; H01S 3/098 ;
Abstract
A target is laser shock peened by directing against an ablative coating thereon a laser beam pulse having a fluence, duration, and corresponding peak power effective for ablating the coating to form a plasma and shock wave therein. The plasma is confined adjacent the target to plastically deform the target by the shock wave to develop residual compressive stress therein. The pulse has a duration less than ten nanoseconds and a corresponding peak power for increasing coupling efficiency between the pulse and plasma.