The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2001
Filed:
Mar. 24, 1998
David B. Larsen, Woburn, MA (US);
AGFA Corporation, Wilmington, MA (US);
Abstract
The present invention eliminates artifacts in an image formed using a plurality of imaging sources. Visible seams in the image are eliminated by randomizing the stitch point between the scan lines produced by each imaging source. The randomization may be optimized by additionally applying a method for relocating the random stitch point based on the data content of the scan line, adjacent scan lines, and other criteria. The present invention further compensates for in-scan and cross-scan errors caused by thermally induced errors, spinner synchronization errors, mechanical misalignment, and other factors associated with the use of a plurality of imaging systems. A photodetector system, comprising a mask having a pair of triangular openings, provides measurements of the in-scan and cross-scan errors.