The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 27, 2001

Filed:

Mar. 05, 1998
Applicant:
Inventor:

Phillip R. Elkins, Goose Creek, SC (US);

Assignee:

Albany International Corp., Albany, NY (US);

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C32B 5/26 ;
U.S. Cl.
CPC ...
C32B 5/26 ;
Abstract

An on-machine-seamable papermakers' fabric includes a first and a second base fabric, each of which is joined into endless form with a seam. The first and second base fabrics are attached to one another by at least one layer of staple fiber batt entangled therethrough such that they are offset with respect to one another in a lengthwise direction when so joined. As a consequence, seaming loops at one widthwise edge of the first base fabric coincide with a non-seam region of the second base fabric, and seaming loops at one widthwise edge of the second base fabric coincide with a non-seam region of the first base fabric. These coincident non-seam regions have additional flow-resistant material included so that when the on-machine-seamable papermakers' fabric is joined into endless form by closing both seams, it may, in the vicinities of the seams, have permeabilities to air and water substantially identical to the remainder of the fabric body thereof. Alternatively, the on-machine-seamable papermakers' fabric includes a multi-layered integrally woven base fabric having two systems of machine-direction yarns forming seaming loops in two distinct rows separated from one another in a thicknesswise direction of the fabric along each of its two widthwise edges. The two distinct rows are offset with respect to one another in a lengthwise direction of the base fabric. As a consequence, the seaming loops in one row coincide with a non-seam region of the base fabric at each widthwise edge thereof. The coincident non-seam regions, as above, have additional flow-resistant material.


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