The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2001
Filed:
Feb. 04, 1999
Toru Abiko, Miyagi, JP;
Kazutomo Miyata, Miyagi, JP;
Sony Corporation, Tokyo, JP;
Abstract
An optical recording medium having sufficient repetition recording durability and its manufacturing method. A first dielectric layer,is layered on a major surface,of a substrate,, and a recording layer,, made up of two layers, namely a first thin film,and a second thin film,having different crystallization start temperatures, is formed on the first dielectric layer,. A second dielectric layer,, a reflective layer,and a protective layer,are then sequentially formed. One of the first thin film,or the second thin film,preferably contains nitrogen or oxygen. It is more desirable that the first thin film,lying towards the substrate,contains nitrogen or oxygen. The difference between the crystallization start temperature of the first thin film,and that of the second thin film,be 20° C. or more. It is more desirable that the crystallization start temperature of the first thin film,lying towards the substrate,be higher by 20° C. or more than that of the second thin film,. The thicknesses of the first thin film,and the second thin film,are desirably each 3 nm or more.