The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2001
Filed:
Mar. 18, 1999
Jean-Jacques H. Psaute, Colchester, VT (US);
International Business Machines Corporation, Armonk, NY (US);
Abstract
An apparatus (,) for depositing a thin film on each surface (,) of a plurality of substrates, such as wafers (,). The apparatus comprises a liner tube (,) having a first end (,), a second end (,) and an interior (,) capable of accommodating the substrates between the first and second ends. The apparatus includes a gas supply system (,) for providing a reactive gas to the liner tube interior at or near its first end, and a gas exhaust system (,) to exhaust the gas emerging from the second end. A gas flow restrictor (,) is arranged at the second end and is designed so as to restrict the flow of the gas at the second end such that the gas flow velocity at the first end is substantially the same as the gas flow velocity at the second end. This uniformizes the gas flow between the substrates within the liner tube, which results in the thin film being deposited more uniformly on each wafer surface.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile