The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2001
Filed:
Sep. 22, 1998
Chen-Lu Yang, Millburn, NJ (US);
Beltran, Inc., Brooklyn, NY (US);
Abstract
An emission treatment system for removing oxides of nitrogen (NO,), from flue gases includes in the pretreatment portion a continuous plasma reactor receiving and modifying the gaseous effluent by applying a plasma discharge thereto. The plasma discharge, upon application to the gaseous effluent, decomposes the majority of the gaseous effluent to nitrogen and oxygen and oxidizes nitric oxide to nitrogen dioxide. A preconditioning section is also provided for further modifying the gaseous effluent by washing the same with a mildly alkaline solution for removing ozone and lowering the process temperature. A continuous chemical scrubber uses an absorbent medium to substantially eliminate the nitrogen dioxide from the effluent and releases nitrogen and oxygen to the atmosphere.