The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2001
Filed:
Apr. 29, 1998
Applicant:
Inventors:
Andrew T. Hunt, Atlanta, GA (US);
Tzyy Jiuan Hwang, Alpharetta, GA (US);
Helmut G. Hornis, Hudson, OH (US);
Hong Shao, Doraville, GA (US);
Joe Thomas, Atlanta, GA (US);
Wen-Yi Lin, Doraville, GA (US);
Shara S. Shoup, Woodstock, GA (US);
Henry A. Luten, Doraville, GA (US);
John Eric McEntyre, Atlanta, GA (US);
Assignee:
Morton International Incorporated, Chicago, IL (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01B 1/06 ; C23C 1/644 ;
U.S. Cl.
CPC ...
H01B 1/06 ; C23C 1/644 ;
Abstract
Precursor solutions are provided to produce thin film resistive materials by combustion chemical vapor deposition (CCVD) or controlled atmosphere combustion chemical vapor deposition (CACCVD). The resistive material may be a mixture of a zero valence metal and a dielectric material, or the resistive materials may be a conductive oxide.