The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 27, 2001
Filed:
Jan. 18, 2000
Chen-Lieh Pan, Ilan Hsing, TW;
QDS Injection Molding Inc., San Diego, CA (US);
Abstract
A structural improvement of a diving mask which consists of a main frame, a sub-frame, a lens and a skirt. Tenons are provided on the sub-frame, engaging mortises on the lens. A soft connecting edge is provided on the skirt, which is closely connected with a periphery of the lens. A rigid structure is established by the tenon jointing the sub-frame with the lens, and the connecting frame of the skirt is closely connected with periphery of the lens, when the main frame is connected with sub-frame. This construction allows the diving mask lens removal and keeps a stable connecting state after its assembly.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile