The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2001
Filed:
Jul. 06, 1998
Ching-Bore Wang, Fremont, CA (US);
Micro Lithography, Inc., Sunnyvale, CA (US);
Abstract
The present invention provides a photomask protection system for minimizing contamination resulting from the removal of a pellicle from a photomask. The system comprises a continuous wall attached to the photomask and disposed between the region of the mask where the pellicle attaches and the photomask pattern. The wall is dimensioned to fit within the pellicle and to be spaced from the pellicle membrane and the pellicle frame. The wall minimizes the likelihood that any contaminants generated by the removal of a pellicle frame from the photomask surface will reach the photomask pattern. The wall may be coated with an adhesive to capture any contaminants that contact it. The present invention also provides a method for minimizing the contamination of a photomask during the removal and replacement of a pellicle, comprising the steps of attaching a barrier to the photomask surface wherein the barrier surrounds the photomask pattern and fits within the pellicle without contacting the pellicle frame or pellicle membrane.