The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2001
Filed:
Jul. 13, 1998
Applicant:
Inventors:
Noribumi Tachihara, Tokyo, JP;
Nobuyoshi Inoue, Tokyo, JP;
Shigemi Takahashi, Tokyo, JP;
Takao Ogawa, Tokyo, JP;
Assignee:
Nidec Copal Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 9/40 ;
U.S. Cl.
CPC ...
G03B 9/40 ;
Abstract
A light-shielding blade material is provided that contributes to increased focal plane shutter speeds. A focal plane shutter has a front blade group and a rear blade group, each being composed of a plurality of light-shielding blades. At least one of these light-shielding blades is made of a Be-Al alloy material containing 40% by weight or more of Be, and has a thickness of 40 to 150 microns. This light-shielding blade is light in weight and high in stiffness, thereby significantly contributing the increased focal plane shutter speeds.