The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 20, 2001
Filed:
Dec. 13, 1994
Applicant:
Inventor:
Takeshi Akimoto, Tokyo, JP;
Assignee:
NEC Corporation, Tokyo, JP;
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 1/600 ;
U.S. Cl.
CPC ...
C23C 1/600 ;
Abstract
A microwave plasma processing apparatus for producing plasma from processing gas by a microwave and processing a wafer or similar semiconductor by the plasma. The apparatus includes a mechanism which allows the areas of radiation ports formed in an upper electrode to be changed independently of each other. This allows a plasma distribution in a plasma processing chamber to be controlled in any desired manner.