The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2001
Filed:
Mar. 31, 2000
Kenichiro Chisaka, Hyogo, JP;
Other;
Abstract
A method of generating electron-beam data used for creating a mask for a layout pattern of a semiconductor integrated circuit by parallel processing a layout pattern of a semiconductor integrated circuit with a parallel data processing unit based on at least one of (i) design layers of the semiconductor integrated circuit, (ii) fabrication processes used in fabricating a mask for the layout pattern, and (iii) segments, each segment being an electron-beam radiation region of the mask. The data processing is divided and divided portions of the data processing are as-signed to respective parallel-connected processing circuits. The parallel data processing unit includes a hierarchy developing A unit for developing, in parallel processing, a hierarchy of the layout pattern for respective design layers by assigning the hierarchy developing to respective parallel-connected processing circuits. The format of data processed by parallel processing is converted into electron-beam data and output.