The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Feb. 13, 2001

Filed:

Aug. 11, 1998
Applicant:
Inventors:

Norio Shimizu, Fukaya, JP;

Shinichiro Nakagawa, Fukaya, JP;

Masatsugu Inoue, Kumagaya, JP;

Assignee:

Kabushiki Kaisha Toshiba, Kawasaki, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 2/907 ;
U.S. Cl.
CPC ...
H01J 2/907 ;
Abstract

A shadow mask opposing a phosphor screen includes a substantially rectangular mask body having a number of electron beam passage apertures, and a substantially rectangular mask frame having four side walls supporting a periphery of the mask body. Among the side walls, a pair of long side walls each has a central connecting portion which is located at a central portion thereof in lengthwise direction and fixed to the mask body, and a pair of protruding portions which are provided on both sides of the central connecting portion in the lengthwise direction and protrude in a direction apart from the mask body. Each protruding portion defines a gap between the side wall and the mask body, and a width of the gap gradually increases as it goes far from the central connecting portion.


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