The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2001
Filed:
Feb. 25, 1999
Kinji Matsushima, Shinjuku-Ku, JP;
Tomonobu Sumino, Shinjuku-Ku, JP;
Yukihiro Andou, Shinjuku-Ku, JP;
Abstract
A method of forming raised and recessed patterns comprising: the first step of forming over a substrate a photosensitive resin layer including an alkali-insoluble resin and a negative type photosensitive resin, or the first step of forming over a substrate a photosensitive resin layer including a thermosetting resin and a negative type photosensitive resin and then heat-treating the photosensitive resin layer to harden at least a part of the thermosetting resin; the second step of exposing the photosensitive resin layer; and the third step of developing the photosensitive resin layer and hardening it to form a raised and recessed pattern including raised portions representing an exposed region and recessed portions representing an unexposed region. Liquid crystal display color filters which comprises over the substrate a colored layer, and a transparent protective layer and transparent columnar raised portions formed by one of the above two methods.
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile