The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Feb. 13, 2001
Filed:
Mar. 23, 1999
Applicant:
Inventors:
Ryo Kuroda, Kawasaki, JP;
Junji Ohyama, Yokohama, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 9/00 ; G03C 5/00 ;
U.S. Cl.
CPC ...
G03F 9/00 ; G03C 5/00 ;
Abstract
A mask is used in an evanescent light exposure apparatus in which the mask, with a front side provided with minute aperture patterns, is disposed opposite to an object to be exposed. The mask is irradiated with light from its back side, and the object is exposed to the minute aperture patterns, whereby the patterns are transferred thereto, by evanescent light that emerges from the minute aperture patterns. The outermost surface on the front side of the mask has an adsorption preventor.